Adisyn Unveils Dual ALD Systems to Propel Graphene Chip Innovation

A Leap Forward in Graphene Semiconductor Research

Adisyn Ltd (ASX – AI1) has marked a significant milestone by successfully commissioning a state-of-the-art Atomic Layer Deposition (ALD) system at its wholly owned subsidiary 2D Generation’s research facility in Israel. The Beneq TFS 200 ALD system, renowned for its precision and advanced capabilities, is now fully operational following extensive infrastructure upgrades designed to meet the exacting demands of semiconductor research.

ALD technology is critical in the semiconductor industry for depositing ultra-thin material layers with atomic-level control, a process essential for developing next-generation chips. Adisyn’s new system boasts enhanced process control, wider temperature ranges, and higher throughput compared to legacy equipment, positioning the company at the forefront of graphene-based semiconductor innovation.

Dual-System Strategy Accelerates Development

In a strategic move to expedite research, Adisyn is operating this new ALD system in tandem with an identical Beneq TFS 200 unit located at Tel Aviv University’s Jan Koum Center for Nanoscience and Nanotechnology. This dual-platform approach enables parallel testing of graphene films across various substrates and conditions, significantly accelerating validation and refinement of their proprietary low-temperature graphene deposition process.

Such collaboration not only enhances experimental throughput but also strengthens the robustness of results, a crucial factor as Adisyn aims to overcome existing performance barriers in semiconductor interconnect technology. The company’s focus on low-temperature processes is particularly noteworthy, as it promises compatibility with sensitive chip manufacturing steps and potential energy savings.

Infrastructure and Operational Enhancements

The commissioning followed comprehensive upgrades at the 2D Generation facility, including advanced environmental controls and high-spec electrical systems tailored to support the precision requirements of ALD research. These improvements underscore Adisyn’s commitment to creating a world-class research environment capable of driving breakthrough semiconductor materials development.

Chairman Kevin Crofton highlighted the operational leap this system represents, emphasizing its role in enabling rigorous testing under real-world semiconductor conditions. The company plans to validate prior technical achievements and expand its understanding of scalable graphene processes, with a development roadmap update expected in the first quarter of fiscal 2026.

Implications for the Semiconductor Industry

Adisyn’s advancements come at a pivotal time as the semiconductor industry seeks materials that can support faster, more energy-efficient chips to power AI, telecommunications, and data storage technologies. Graphene’s exceptional electrical and thermal properties make it a promising candidate for overcoming the limitations of traditional interconnect materials.

While commercial application remains on the horizon, the successful deployment of these ALD systems signals a tangible step toward scalable graphene integration in semiconductor manufacturing. Investors and industry watchers will be keenly observing the forthcoming validation results and roadmap disclosures to gauge the company’s trajectory in this competitive space.