Adisyn Ltd has achieved a critical milestone in its pioneering low-temperature graphene deposition technology, validated by an independent expert, positioning the company for potential semiconductor industry integration.
- Successful validation of wafer surface pre-clean sub-process
- Independent confirmation of low-temperature sp² carbon layer deposition
- Strategic review highlights growth opportunities in semiconductor business
- Strong cash position with A$4.9 million and no debt
- Considering options for IT services business unit to unlock shareholder value
Technical Milestone Achieved in Graphene Deposition
Adisyn Ltd (ASX, AI1) has reported a significant breakthrough in its development of low-temperature graphene deposition technology, a key enabler for next-generation semiconductor interconnects. The company successfully validated a crucial sub-process within its proprietary wafer surface pre-clean stage, which prepares semiconductor wafers for graphene growth. This step is vital to ensure the atomic-scale cleanliness and surface chemistry required for high-quality graphene films.
Following the quarter, an independent expert, Professor Yoram Selzer from Tel Aviv University, confirmed that Adisyn achieved low-temperature deposition of an sp²-based carbon layer using an Atomic Layer Deposition (ALD) system. This confirmation is a major technical validation, as traditional graphene growth methods require prohibitively high temperatures incompatible with semiconductor manufacturing.
Implications for Semiconductor Industry Integration
The ability to deposit graphene at temperatures below 300°C addresses a critical barrier to integrating graphene into existing semiconductor fabrication processes. Copper interconnects, currently standard in chips, face physical limits as feature sizes shrink below 2 nanometres, leading to increased resistance and heat. Graphene’s superior electrical and thermal properties offer a promising alternative to overcome these challenges, potentially enabling faster, smaller, and more energy-efficient chips.
Adisyn’s patented low-temperature ALD approach could therefore be a game-changer, offering a scalable and repeatable process for graphene integration. The company plans to advance its development by expanding deposition trials, refining pre-clean sub-processes, and characterising film quality to optimise performance.
Strategic Review and Business Outlook
Alongside its technical progress, Adisyn completed a strategic review of its business units, identifying significant growth opportunities in its semiconductor-focused subsidiary, 2D Generation (2DG). The review suggests reallocating capital to accelerate semiconductor technology development, while exploring options for its managed IT services business, including potential sale or partnership arrangements. No definitive agreements have been made yet, but the company is actively considering alternatives to unlock shareholder value.
Financially, Adisyn remains well positioned with a strong balance sheet, holding A$4.9 million in cash and no debt. The company generated $860,000 in revenue during the quarter and used $1.1 million in operating cash flow, reflecting ongoing investment in research and development.
As Adisyn progresses through its development roadmap, the market will be watching closely to see how these technical advances translate into commercial opportunities within the semiconductor sector.
Bottom Line?
Adisyn’s validated low-temperature graphene deposition milestone sets the stage for scaling semiconductor innovation amid strategic business realignment.
Questions in the middle?
- How soon can Adisyn scale its graphene deposition process to wafer-level production?
- What strategic moves will the company make regarding its IT services business unit?
- How will semiconductor industry partners respond to Adisyn’s technology validation?